DisChem

DisChem, Inc. is an American specialty chemicals company based in Ridgway, Pennsylvania, that positions itself around the phrase "Chemistry for Advanced Lithography." Its product line is aimed at micro and nano device manufacturing, spanning hologram and optical media production through state-of-the-art microlithography and electron-beam lithography (EBL). The company describes its mission as providing chemical solutions that increase yield while reducing cost and process waste for advanced lithographic manufacturing. DisChem's catalog is organized around a small set of branded specialty chemicals. H-SIQ (also written H-SiQ or HSQ) is a negative-tone hydrogen silsesquioxane electron-beam resist derived from dry silica resin in a semiconductor-grade MIBK carrier solvent, marketed for direct-write thin-film EBL applications and characterized by pitch resolution, sensitivity and etch resistance. DisCharge is an anti-charging agent used in electron-beam lithography to prevent charge accumulation on electrically insulated substrates. SurPass is a waterborne agent that promotes adhesion and improves coating quality across a broad range of substrate materials used in photon and electron beam lithography. DisClean is a cationic surface-active agent for removing water stains, oxidation products, organic residues and electrostatic contaminants from optical electroforms and substrates. E-Form is an electronic-grade sulfamate nickel low-stress electroforming concentrate designed and manufactured specifically for electronics manufacturing. StamperPrep and other products round out the portfolio. The company serves customers in semiconductor, photonics, optical media and related high-technology manufacturing segments, and it invites inquiries about both new products and well-priced commodity chemicals. Its operations are located at 17295 Boot Jack Rd, Suite A, in Ridgway, Pennsylvania, with contact channels including a US phone number and a general information email address. DisChem is a privately held company; no parent company, ownership group or stock listing is indicated in the available evidence. Its public communications emphasize technical application notes and blog content on topics such as HSQ resist performance, charge management in EBL, and nickel electroforming for high-precision industrial innovation.

DisChem, Inc. is a privately held American specialty chemicals company located in Ridgway, Pennsylvania. Public information about its corporate history is limited; the available evidence identifies it as a company in Ridgway, United States, and its own website presents it as a supplier of "Chemistry for Advanced Lithography" for micro and nano device manufacturing. The company built its identity around a focused portfolio of branded specialty chemicals rather than a broad commodity catalog. Its product pages describe H-SIQ (also styled H-SiQ or HSQ), a negative-tone hydrogen silsesquioxane electron-beam resist derived from dry silica resin in semiconductor-grade MIBK carrier solvent, intended for direct-write thin-film electron-beam lithography and noted for pitch resolution, sensitivity and etch resistance. DisCharge is described as an anti-charging agent for electron-beam lithography that prevents charge accumulation on electrically insulated substrates. SurPass is a waterborne adhesion promoter and coating-quality improver for photon and electron beam lithography substrates. DisClean is a cationic surface-active cleaner for optical electroforms and substrates, removing water stains, oxidation products, organic residues and electrostatic contaminants. E-Form is an electronic-grade sulfamate nickel low-stress electroforming concentrate designed and manufactured specifically for electronics manufacturing. StamperPrep is also listed among its products. DisChem markets these products into applications ranging from holograms and optical media to state-of-the-art microlithography and e-beam manufacturing, emphasizing yield improvement and reductions in cost and process waste. The company maintains a blog with technical posts on subjects such as HSQ resist performance for high-resolution EBL, charge management and beam deflection in electron-beam lithography, and nickel electroforming for high-precision industrial innovation. Its contact details place operations at 17295 Boot Jack Rd, Suite A, PO Box 267, Ridgway, PA 15853, USA, with a US telephone number and an information email address. The website footer carries a 2025 copyright notice for DisChem, Inc. No founding year, founder, parent company, ownership group or stock listing is established by the available evidence.

Specialty chemicals provider focused on advanced lithography and micro/nano device manufacturing, promising higher yield and lower cost and process waste.

• H-SIQ (H-SiQ / HSQ)

  Negative-tone hydrogen silsesquioxane electron-beam resist derived from dry silica resin (H-SiOx) in semiconductor-grade MIBK carrier solvent for electron beam lithography (EBL); characterized by excellent pitch resolution, sensitivity and etch resistance for direct-write thin-film EBL applications.

• DisCharge

  Anti-charging agent used in electron-beam lithography for preventing charge accumulation on electrically insulated substrates.

• SurPass

  Waterborne agent designed to promote adhesion and improve overall coating quality on a broad range of substrate materials used in photon and electron beam lithography.

• DisClean

  Cationic surface active agent designed to remove water stains, oxidation products, organic residues and electrostatic contaminants from optical electroforms and substrates.

• E-Form

  Electronic grade sulfamate nickel low stress electroforming concentrate designed and manufactured specifically for use in electronics manufacturing.

• StamperPrep

  Listed among DisChem's products on its website.

1. 1Microlithography Surpass Chemicals Co INC in the USA - DisChemdischeminc.com
2. 2About Us - dischemincdischeminc.com
3. 3H-SIQ - dischemincdischeminc.com
4. 4Electroforming - dischemincdischeminc.com
5. 5DisChem (United States) - Wikidatawikidata.org