NuFlare Technology, Inc.

NuFlare Technology, Inc. (abbreviated NFT) is a Japanese company established on August 1, 2002, when it succeeded the semiconductor equipment business of Toshiba Machine Co., Ltd. It is wholly owned by Toshiba Corporation. Its business centers on semiconductor manufacturing equipment, notably electron-beam mask writers and mask inspection systems, and it operates domestic and overseas bases including in the United States, South Korea, Taiwan, and Germany.

In December 1976, technology for the semiconductor manufacturing equipment business, centered on electron-beam mask writers, was transferred from Toshiba Corporation to Toshiba Machine Co., Ltd. In April 1979, an electron-beam mask writer received the Nikkan Kogyo Shimbun's 'Ten Great New Products Award.' In September 1983, the first unit of the mask inspection system 'APC-130 R,' jointly developed with Toshiba Corporation, began operation at Toshiba. In June 1984, the first Variable Shaped Beam electron-beam mask writer 'EBM-130V' was completed jointly with Toshiba Corporation's Research and Development Center. In March 1989, 'APC-160,' a full model change of 'APC-130 R,' was developed with Toshiba and began operation at Toshiba. In June 1992, the high-speed rotation single-wafer epitaxial growth system HT-2000 (carbon heating method) was jointly developed with Toshiba Corporation, becoming Japan's first single-wafer system. In 1994, 'MC-100,' which greatly reviewed the optical system and improved inspection performance, was developed with Toshiba and began operation at Toshiba. In December 1994, the epitaxial growth system HT2000B was developed and commercialized. In December 1995, it received the Japan Society for the Promotion of Machine Industry Award. In 1997, 'MC-2000,' capable of inspection by transmission and reflection, was developed with Toshiba and began operation at Toshiba. In December 1998, through a joint project with Toshiba Corporation, the Variable Shaped Beam electron-beam mask writer 'EBM-3000' was developed and commercialized; it was the first commercial machine, supporting circuit line widths of 180nm-150nm. In December 1999, 'MC-3000,' equipped for the first time with a laser of light source wavelength 257nm, was developed with Toshiba and began operation at Toshiba. In June 2002, the electron-beam mask writer 'EBM-4000,' supporting circuit line width 90nm, was developed and commercialized (up to this point, Toshiba Machine Co., Ltd. Semiconductor Equipment Division). In June 2002, the Si epitaxial growth system HT3000, supporting 12-inch wafers, was developed and commercialized. In August 2002, NuFlare Technology, Inc. succeeded the business of Toshiba Machine Co., Ltd.'s Semiconductor Equipment Division and began operations. In December 2002, it participated for the first time as NuFlare Technology, Inc. in 'Semicon Japan 2002.' In February 2003, the clean room was expanded to increase manufacturing facilities. In April 2003, it concluded a development consignment contract with TOSHIBA MACHINE COMPANY, AMERICA, the U.S. local subsidiary of Toshiba Machine Co., Ltd., and established the 'USA Satellite' office. In November 2003, it opened the 'Yokohama Satellite' office as a research and development base in Yokohama (in October 2004, the sales department was relocated to the Yokohama Satellite). In December 2003, 'MC-3500,' a minor change of 'MC-3000,' was developed with Toshiba and began operation at Toshiba. In September 2004, 'EBM-5000,' supporting electronic circuit line width 65nm, was developed and commercialized. In November 2004, for the development of 'proximity effect correction technology,' it received the Ohmsha, Ltd. 90th Anniversary Special Award 'Electrical Science and Technology Encouragement Award.' In 2006, 'NT-5000(199),' which adopted for the first time in the world a laser of light source wavelength 199nm, was developed with AMiT and began operation at DTF. In June 2006, it decided to commercialize the mask inspection system business. In March 2007, it opened the Yokohama Office as a core base for the mask inspection system business and drawing system business development. In April 2007, it listed on the JASDAQ Securities Exchange. In October 2007, it relocated its head office to 3-2-6 Shinyokohama, Kohoku-ku, Yokohama, Kanagawa. In February 2008, EBM-6000PLUS (for double patterning research and development) was developed and commercialized. In March 2008, EBM-7000 (supporting hp32nm) was developed and commercialized. In January 2009, 'NPI-6000,' commercialized based on 'NT-5000(199),' was developed, and its first unit was sold to an overseas manufacturer as the first for the inspection system BU, laying the foundation for overseas expansion. In March 2009, a Korean local subsidiary was established. In April 2010, following the merger of the JASDAQ Securities Exchange and the Osaka Securities Exchange, it moved to the Osaka Securities Exchange JASDAQ...

A company that aims to contribute to the semiconductor industry and to humanity and society through semiconductor manufacturing equipment.

• MBM™-4000

  Multi-electron-beam mask writer supporting the A14 node generation.

• EBM-130V

  First Variable Shaped Beam electron-beam mask writer, completed in 1984.

• EBM-3000

  Variable Shaped Beam electron-beam mask writer developed and commercialized in 1998, the first commercial machine, supporting 180nm-150nm circuit line widths.

• EBM-4000

  Electron-beam mask writer supporting 90nm circuit line width, developed and commercialized in 2002.

• EBM-5000

  Electron-beam mask writer supporting 65nm electronic circuit line width, developed and commercialized in 2004.

• EBM-6000PLUS

  Developed and commercialized in 2008 for double patterning research and development.

• EBM-7000

  Developed and commercialized in 2008, supporting hp32nm.

• APC-130 R

  First unit of a mask inspection system jointly developed with Toshiba Corporation, began operation in 1983.

• APC-160

  Full model change of APC-130 R, developed with Toshiba and began operation in 1989.

• MC-100

  Inspection system with greatly reviewed optical system and improved inspection performance, developed with Toshiba and began operation in 1994.

• MC-2000

  Inspection system capable of transmission and reflection inspection, developed with Toshiba and began operation in 1997.

• MC-3000

  Inspection system equipped for the first time with a 257nm wavelength laser, developed with Toshiba and began operation in 1999.

• MC-3500

  Minor change of MC-3000, developed with Toshiba and began operation in 2003.

• NT-5000(199)

  Developed with AMiT in 2006, adopting for the first time in the world a 199nm wavelength laser, began operation at DTF.

• NPI-6000

  Commercialized based on NT-5000(199) in 2009; its first unit was sold to an overseas manufacturer.

• HT-2000

  High-speed rotation single-wafer epitaxial growth system (carbon heating method), jointly developed with Toshiba Corporation in 1992, Japan's first single-wafer system.

• HT2000B

  Epitaxial growth system developed and commercialized in 1994.

• HT3000

  Si epitaxial growth system supporting 12-inch wafers, developed and commercialized in 2002.

1. 1株式会社ニューフレアテクノロジーnuflare.co.jp
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3. 3企業情報 | 株式会社ニューフレアテクノロジーnuflare.co.jp
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